ASML has significantly raised their sales forecast for 2025 for their launch of the next-generation extreme ultraviolet (EUV) semiconductor exposure equipment 'High NA'. Both sales and net profit are expected to more than double compared to last year. This is attributed to the rapid growth of the semiconductor market and increased demand for EUV.
ASML held 'ASML Investor Day' on the 29th (Netherlands local time) and raised its sales forecast for 2025 to a maximum of 30 billion euros (about 41.27 trillion KRW). The previous forecast for ASML in 2025 was 24 billion euros. Considering that ASML's sales last year were 14 billion euros, they predicted that sales will more than double in five years.
The net profit margin forecast has also been raised significantly. ASML recorded a net profit margin of 25% last year and has raised the forecast for 2025 to 54-56%. ASML CEO Peter Wennink said, “We expect the growth to continue beyond 2025.Through 2030, ASML sales will grow at a CAGR of 11%.”
ASML's high earnings forecast is attributable to the prediction that the demand for ASML's major products will greatly expand in line with the growth of the semiconductor industry and the spread of advanced microprocessors. ASML is the exclusive supplier of EUV exposure equipment required for advanced micro-processing below 10nm process. Samsung Electronics, SK Hynix, and TSMC are the major customers of ASML EUV equipment. As Intel and Micron are also preparing to adopt ASML EUV equipment, the customer base is expected to expand.
ASML predicts that by 2024, all major high-tech semiconductor manufacturers will start operating EUV equipment. As the number of EUV application layers increases by semiconductor manufacturers, they are expected to purchase additional EUV equipment as well.
The development and launch of next-generation EUV equipment also contributed to ASML's confidence in sales. 2025 is the year when ASML predicts that sales and net profit will more than double, and it is a start point for the high-NA EUV equipment will be mass-produced. High NA EUV equipment raises the exposure numerical aperture (NA) from 0.33 to 0.55, allowing micro-circuits to be drawn in a less number of times. This reduces the number of masks engraved with circuit patterns, thereby reducing costs and shortening process times.
Currently, Intel has signed a contract to adopt ASML high NA EUV equipment first. When large-scale mass production of high NA EUV equipment begins, other semiconductor manufacturers such as Samsung Electronics and TSMC are highly likely to purchase the equipment as well. Christophe Fouquet, ASML Senior Vice President, said, “We will expand our EUV equipment and introduce 0.55 NA EUV equipment to meet our customers' continued demand for microcircuit patterning. Through this, we expect the value of EUV equipment to continue for the next 10 years.”
Meanwhile, ASML said at the event, “Through continuous investment, we will put effort to increase shareholder value based on technological leadership.” And he continued, “We will strive for the benefit of our shareholders by steadily increasing dividends and repurchasing treasury stocks.”
By Staff Reporter Dongjun Kwon (djkwon@etnews.com)