On the 4th, Merck and Micron Technology announced that they would cooperate to develop semiconductor gas that has a low global warming potential. Micron Technology is verifying the performance of an etching gas that replaces existing resource that has a high global warming potential. The Merck R&D team developed the etching gas.
Merck and Micron Technology explained that their goal is to introduce sustainable gas solutions for future semiconductor production permanently. Both companies are also collaborating on researching materials to replace a high global warming potential etching gas, used in dry etching and chamber cleaning.
Kai Beckmann, CEO of Merck, said, “In order to achieve sustainability requires collaboration, and find a common goal to achieve greater value. Merck has been instrumental in achieving Micron Technology’s sustainability goals.”
John Whitman, Vice President of Micron Technology, said, “By 2030, Micron Technology has set a goal of reducing greenhouse gas emissions from its global operations by 42% compared to 2020. With innovation partner, Merck, we will collaborate to achieve the net-zero goal in many ways.”
Meanwhile, Merck has set a goal to reduce greenhouse gas emissions by 50%, combining both direct (Scope 1) and indirect (Scope 2) emissions by 2030. As most of the greenhouse gases are emitted during the production of special chemical products for the electronics industry, Merck is working to improve the process.
By Staff Reporter Yoon-seop Song (sys@etnews.com)